Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)
German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung von Elementspuren in Flüssigkeiten - Teil 4: Bestimmung von 34 Elementen in hochreinem Wasser durch Massenspektrometrie mit induktiv gekoppeltem Plasma (ICP-MS)
Publication date
2024-09
Original language
German
Pages
15
Publication date
2024-09
Original language
German
Pages
15
DOI
https://dx.doi.org/10.31030/3550942
Product information on this site:
Quick delivery via download or delivery service
Buy securely with a credit card or pay upon receipt of invoice
All transactions are encrypted
Overview
This document specifies a test method for determining the mass fractions of 34 elements in the extreme trace range in ultrapure water, using inductively coupled plasma mass spectrometry (ICP-MS) as the determination method. The method applies to elemental trace mass fractions from 10 ng/kg to 1 000 ng/kg. This document has been prepared by Working Committee NA 062-02-21 AA "Prüfung von Prozesschemikalien für die Halbleitertechnologie" ("Testing of process materials for semiconductor technology") at DIN Standards Committee Materials Testing (NMP).
Please get in touch with the relevant contact person at DIN if you have problems understanding the content of the standard or need advice on how to apply it.