Atomic layer deposition - Chemical characteristics and related process specifications of atomic layer deposition precursors

Draft standard

ISO/FDIS 19383:2026-02 - Draft

Atomic layer deposition - Chemical characteristics and related process specifications of atomic layer deposition precursors

German title
Atomlagenabscheidung - Chemische Eigenschaften von Vorläufersubstanzen für die Atomlagenabscheidung und damit zusammenhängende Verfahrensspezifikationen
Publication date
2026-02
Original language
English
Pages
13

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Publication date
2026-02
Original language
English
Pages
13
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Replacement amendments

This document replaces ISO/DIS 19383:2025-05 .

Cooperation at DIN

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