Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 62047-14:2012) (german version)

Standard [CURRENT]

OEVE/OENORM EN 62047-14:2012-11-01

Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 62047-14:2012) (german version)

German title
Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik - Teil 14: Verfahren zur Ermittlung der Grenzformänderung metallischer Dünnschichtwerkstoffe (IEC 62047-14:2012) (deutsche Fassung)
Publication date
2012-11-01
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Original language
German
Pages
20

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Publication date
2012-11-01
Original language
German
Pages
20
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