Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of methane impurity in H₂, O₂, N₂, Ar and He by using a flame ionization detector (FID)
German title
Prüfung von Materialien für die Halbleitertechnologie; Bestimmung von Verunreinigungen in Träger- und Dotiergasen; Bestimmung von Methanverunreinigungen in Wasserstoff, Sauerstoff, Stickstoff, Argon und Helium mit einem Flammenionisationsdetektor (FID)
Publication date
1991-03
Original language
German
Pages
2
Publication date
1991-03
Original language
German
Pages
2
DOI
https://dx.doi.org/10.31030/2405852
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ICS
29.045,
71.100.20
DOI
https://dx.doi.org/10.31030/2405852
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